WAFER-SHAPED TOOL CONFIGURED TO MONITOR PLASMA CHARACTERISTICS AND PLASMA MONITORING SYSTEM USING THE SAME
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United States of America Patent
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Issued Date -
Mar 19, 2015
app pub date -
Jul 7, 2014
filing date -
Sep 16, 2013
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Abstract
Provided are tools and systems to monitor plasma characteristics. The tool may include a housing, and a sensor array, a signal processor, and a data-transferring device provided in the housing. The sensor array may include a plurality of measurement sensors two-dimensionally arranged in the housing, each of the measurement sensors including a shielding layer configured to prevent an electrical interaction with charged particles in plasma, the signal processor may be configured to process electrical signals produced by the measurement sensors, and thereby generate measurement data, and the data-transferring device may be configured to transmit the measurement data to the outside.
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