DEPOSITION APPARATUS
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United States of America Patent
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Issued Date -
Mar 26, 2015
app pub date -
Sep 12, 2014
filing date -
Sep 26, 2013
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
A deposition apparatus comprises a source unit having a function of generating a plasma by an arc discharge; and a filter unit configured to transport the plasma generated by the source unit toward a material to be deposited, wherein the filter unit includes a duct configured to transport the plasma, a magnetic field formation unit configured to form, in the duct, a magnetic field for transporting the plasma, and a magnetic field bending unit configured to generate a magnetic force for bending the magnetic field formed by the magnetic field formation unit.
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