SUBSTRATE PROCESSING DEVICE AND SUBSTRATE PROCESSING METHOD

United States of America Patent

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Issued Date
Apr 2, 2015
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Sep 24, 2014
filing date
Sep 30, 2013

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Abstract

A substrate processing device 100 includes a solvent replacing unit (organic solvent supply unit 15 and solvent supply unit 34) replacing a cleaning liquid with a volatile solvent of a low concentration, and thereafter further performing replacement with a volatile solvent of a high concentration.

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Patent Owner	Address
SHIBAURA MECHATRONICS CORPORATION	5-1 KASAMA 2-CHOME SAKAE-KU YOKOHAMA-SHI KANAGAWA 247-8610

International Classification(s)

B08B:CLEANING IN GENERAL; PREVENTION OF FOULING IN GENE....

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[Patents Count]

Inventor(s)

Inventor Name	Address	# of filed Patents	Total Citations
AZUMANO, Hidehito	Yokohama-shi, JP	8	55
FURUYA, Masaaki	Yokohama-shi, JP	41	178
HAYASHI, Konosuke	Yokohama-shi, JP	29	113
MATSUSHITA, Jun	Yokohama-shi, JP	9	28
MIYAZAKI, Kunihiro	Yokohama-shi, JP	56	592
NAGASHIMA, Yuji	Yokohama-shi, JP	31	726
TAUCHI, Toyoyasu	Yokohama-shi, JP	2	8

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SUBSTRATE PROCESSING DEVICE AND SUBSTRATE PROCESSING METHOD

Number of patents in Portfolio can not be more than 2000

United States of America Patent

14495118

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