SUBSTRATE PROCESSING DEVICE AND SUBSTRATE PROCESSING METHOD
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United States of America Patent
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Apr 2, 2015
app pub date -
Sep 24, 2014
filing date -
Sep 30, 2013
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Abstract
A substrate processing device 10 has a water removing unit 110 and, when a solvent supply unit 58 supplies a volatile solvent to a surface of a substrate W, the water removing unit 110 supplies a water removing agent to the surface of the substrate W to promote replacement of the cleaning water on the surface of the substrate W with the volatile solvent.
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