SUBSTRATE PROCESSING DEVICE AND SUBSTRATE PROCESSING METHOD
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United States of America Patent
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Issued Date -
Apr 2, 2015
app pub date -
Sep 24, 2014
filing date -
Sep 30, 2013
priority date (Note) -
Abandoned
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Abstract
In a substrate processing device 10, a magnetic field forming unit is added to a solvent supply unit 58. The magnetic field forming unit 100 applies a magnetic field to a surface of a substrate W on which a cleaning liquid and a volatile solvent coexist. The magnetic field forming unit stirs and mixes the cleaning liquid and the volatile solvent on the surface of the substrate W to promote replacement of the cleaning liquid with the volatile solvent.
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