TREATMENT CUP CLEANING METHOD, SUBSTRATE TREATMENT METHOD, AND SUBSTRATE TREATMENT APPARATUS
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United States of America Patent
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app pub date -
Sep 22, 2014
filing date -
Sep 27, 2013
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
A treatment cup cleaning method is provided, which includes: a rotating step of rotating a substrate rotating unit with a substrate being held by the substrate rotating unit; a cleaning liquid supplying step of supplying a cleaning liquid to an upper surface and a lower surface of the substrate and causing the cleaning liquid to scatter from a peripheral edge of the substrate to be applied to an inner wall of a treatment cup in the rotating step, whereby the cleaning liquid is supplied to the inner wall of the treatment cup; and a scattering direction changing step of changing a cleaning liquid scattering direction in which the cleaning liquid scatters from the peripheral edge of the substrate in the rotating step and the cleaning liquid supplying step.
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