NOZZLE DESIGN FOR IMPROVED DISTRIBUTION OF REACTANTS FOR LARGE FORMAT SUBSTRATES
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United States of America Patent
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N/A
Issued Date -
Apr 9, 2015
app pub date -
Oct 3, 2013
filing date -
Oct 3, 2013
priority date (Note) -
Abandoned
status (Latency Note)
Importance
Abstract
Systems, methods and apparatus for processing a substrate are disclosed. A reactor for processing a substrate includes a reaction chamber, a substrate support, a nozzle, and an outlet. The chamber is configured to process a single substrate on the substrate support. The nozzle extends along an axis of elongation along a side of the chamber. The nozzle includes a nozzle body forming an inner volume, an inlet providing fluid communication between a reactant source and the inner volume, and a plurality of holes spaced along the axis of elongation. The holes provide fluid communication between the inner volume of the nozzle body and the reaction chamber. The nozzle is configured such that fluid conductance through the holes increases with increasing distance from the inlet. The outlet is configured to allow flow from the nozzle through the reaction chamber to the outlet. The flow is parallel to a major surface of the substrate.
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