Fe-Pt-Based Sputtering Target Having Nonmagnetic Substance Dispersed Therein
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United States of America Patent
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Issued Date -
Apr 23, 2015
app pub date -
Aug 21, 2013
filing date -
Oct 25, 2012
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Abandoned
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Abstract
A sintered compact sputtering target configured from an alloy having a composition comprising Pt at a molecular ratio of 35 to 55% and remainder being Fe, and a nonmagnetic substance dispersed in the alloy, wherein the nonmagnetic substance contains at least SiO2, SiO2 is amorphous, and a residual oxygen amount, which is obtained by subtracting an amount of oxygen contained as a constituent of the nonmagnetic substance from a total amount of oxygen contained in the target, is 0.07 wt % or less. An object of this invention is to provide a sintered compact sputtering target having a structure in which a nonmagnetic substance containing SiO2 is dispersed in an Fe—Pt-based alloy and capable of suppressing the crystallization of SiO2 into cristobalite, and reducing the amount of particles that is generated during sputtering.
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