METHOD FOR CONSISTENTLY TEXTURIZING SILICON WAFERS DURING SOLAR CELL WET CHEMICAL PROCESSING

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United States of America Patent

APP PUB NO 20150118785A1
SERIAL NO

14398934

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Abstract

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A method for consistently texturizing silicon wafers dating solar cell wet chemical processing. In one aspect, the invention includes submerging a batch of silicon wafers within a process chamber having an alkaline solution mixture therein. The invention utilizes a feed and bleed technique to bleed chemicals from the process chamber and introduce fresh chemicals into the process chamber to maintain chemical concentrations within a desired range and to maintain etch by-products below a threshold. The alkaline solution etches the silicon wafers to texturize the surfaces of the silicon wafers to form a pattern of pyramids (i.e., texturization pattern) on the surface of the silicon wafers. The feed and bleed technique enables the texturization pattern on the surfaces of the processed wafers and the reflectance of the processed wafers to be consistent among different batches of silicon wafers that are submerged into the alkaline mixture in the process chamber.

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Patent Owner(s)

Patent OwnerAddress
NAURA AKRION INC6330 HEDGEWOOD DRIVE SUITE 150 ALLENTOWN PA 18106

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chen, Gim-Syang Allentown, US 15 97
Kashkoush, Ismail Orefield, US 38 336
Nemeth, Dennis Nazareth, US 12 37
Rieker, Jennifer Whitehall, US 6 7

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