Exposure apparatus, exposure method, and device manufacturing method
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United States of America Patent
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Aug 23, 2016
Grant Date -
May 7, 2015
app pub date -
Oct 31, 2014
filing date -
Nov 5, 2013
priority date (Note) -
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Abstract
An exposure apparatus is provided with a light source for emitting pulse light and exposes a substrate via to the pulse light an original. Further, the exposure apparatus comprises a detection unit for detecting the light quantity of the pulse light and a controller for controlling the light source and the detection unit. Here, the controller is configured to execute a first calibration process for obtaining a relation between a control input to the light source and a light quantity of a pulse light from the light source, based on light quantities of a plurality of pulse lights detected by the detector by causing the light source to emit the plurality of the pulse lights with a plurality of the control input, in parallel with execution of a second calibration process which is different from the first calibration process and executed using the plurality of pulse lights.
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