TOPOLOGICALLY STRUCTURED POLYMER COATING

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United States of America Patent

SERIAL NO

14532328

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Abstract

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Sub-micron-structured (nanostructured) polymer film or coatings are made by coating a substrate with a mixture of materials. One of the materials is removed using a selective solvent, leaving pores or other nanostructure. The substrate may be grooved, providing a competing nanostructure. The coating may act as an antireflective coating, optical retarder, optical diffuser, or orientation layer.

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Patent Owner(s)

Patent OwnerAddress
ROLIC AG6300 ZUG

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
BENECKE, Carsten Weil am Rhein, DE 17 237
IBN-ELHAJ, Mohammed Allschwil, CH 17 137
SCHADT, Martin Seltisberg, CH 129 3190
SCHMITT, Klaus Lorrach, DE 60 1813
SEIBERLE, Hubert Weil am Rhein, DE 60 1275

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