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• 15 United States
• 10 France
• 8 Japan
• 7 China
• 5 Korea
• 2 Other

Patent Owner(s)

Patent Owner	Address
SUMITOMO CHEMICAL COMPANY LIMITED	2-7-1 NIHONBASHI CHUO-KU TOKYO 1036020 JAPAN

International Classification(s)

• C08F:MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONL....
• G03F:PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNE....

• [Classification Symbol]

• [Patents Count]

Inventor(s)

Inventor Name	Address	# of filed Patents	Total Citations
Fuji, Yusuke	Ibaraki, JP	21	202
Ichikawa, Koji	Toyonaka, JP	298	1929
Yamaguchi, Satoshi	Kawachinagano, JP	238	2471

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Maintenance Fees

Fee	Large entity fee	small entity fee	micro entity fee	due date
3.5 Year Payment	$1600.00	$800.00	$400.00	Mar 8, 2024
7.5 Year Payment	$3600.00	$1800.00	$900.00	Mar 8, 2028
11.5 Year Payment	$7400.00	$3700.00	$1850.00	Mar 8, 2032

Fee	Large entity fee	small entity fee	micro entity fee
Surcharge - 3.5 year - Late payment within 6 months	$160.00	$80.00	$40.00
Surcharge - 7.5 year - Late payment within 6 months	$160.00	$80.00	$40.00
Surcharge - 11.5 year - Late payment within 6 months	$160.00	$80.00	$40.00
Surcharge after expiration - Late payment is unavoidable	$700.00	$350.00	$175.00
Surcharge after expiration - Late payment is unintentional	$1,640.00	$820.00	$410.00

DATE PUBLISHED	PUBLICATION/PATENT NO.	PUBLICATION TYPE
September 08, 2020	US,10766992,B2   US10766992B2	GRANTED PATENT AS SECOND PUBLICATION
May 14, 2015	US,20150132698,A1   US20150132698A1	FIRST PUBLISHED PATENT APPLICATION

Full Text

US Patent Application No: 2015/0132,698

RESIN AND RESIST COMPOSITION

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