Plasma processing device and plasma processing method

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 9691593
APP PUB NO 20150136735A1
SERIAL NO

14337221

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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To provide a plasma processing device and a plasma processing method capable of performing high-speed processing. In an inductively-coupled plasma torch unit, a coil, a lid and a first ceramic block are bonded together, and a long chamber has an annular shape. Plasma generated in the chamber is ejected from an opening in the chamber toward a substrate. The substrate is processed by moving the long chamber and the substrate mounting table relatively in a direction perpendicular to a longitudinal direction of the opening. The first ceramic block is cooled efficiently by allowing a refrigerant to flow in a refrigerant flow path.

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Patent Owner(s)

  • PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Okumura, Tomohiro Osaka, JP 151 1846

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