Actinic ray-sensitive or radiation-sensitive resin composition, resist film, using the same, pattern forming method, manufacturing method of electronic device, and electronic device

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United States of America Patent

PATENT NO 9551933
APP PUB NO 20150140484A1
SERIAL NO

14605631

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Abstract

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There is provided an actinic ray-sensitive or radiation-sensitive resin composition comprising: (A) a resin containing a repeating unit represented by the first specific formula and a repeating unit represented by the second specific formula, wherein the content of the repeating unit represented by the first specific formula is 35 mol % or more based on all repeating units in the resin (A), a resist film formed using the actinic ray-sensitive or radiation-sensitive resin composition.

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Patent Owner(s)

  • FUJIFILM CORPORATION

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hirano, Shuji Shizuoka, JP 69 301
Nihashi, Wataru Shizuoka, JP 33 105
Takizawa, Hiroo Shizuoka, JP 119 917
Yokokawa, Natsumi Shizuoka, JP 27 119

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