Fabricating self-formed nanometer pore array at wafer scale for DNA sequencing

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United States of America Patent

PATENT NO 9290806
SERIAL NO

14608675

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Abstract

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A technique is provided for a structure. A substrate has a nanopillar vertically positioned on the substrate. A bottom layer is formed beneath the substrate. A top layer is formed on top of the substrate and on top of the nanopillar, and a cover layer covers the top layer and the nanopillar. A window is formed through the bottom layer and formed through the substrate, and the window ends at the top layer. A nanopore is formed through the top layer by removing the cover layer and the nanopillar.

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Patent Owner(s)

  • GLOBALFOUNDRIES INC.

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Stolovitzky, Gustavo A Riverdale, US 76 869
Wang, Deqiang Ossining, US 41 349

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