ALD Coating System
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United States of America Patent
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Issued Date -
Jun 4, 2015
app pub date -
May 31, 2013
filing date -
Jun 19, 2012
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Abstract
An atomic layer deposition (ALD) coating system and a method for depositing an ALD layer in the system are disclosed. In an embodiment an ALD coating system includes a storage container for an organometallic starting material and a device having a control valve, a pressure gage, a pressure diaphragm and a first multiway valve, wherein the device is arranged downstream of the storage container, and wherein the first multiway valve is switchable between a process chamber and a collecting chamber.
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