Positive Photosensitive Resin Composition, Photosensitive Resin Film, and Display Device Using the Same

United States of America Patent

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Issued Date
Jun 11, 2015
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May 30, 2014
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Dec 5, 2013

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Abstract

Disclosed are a positive photosensitive resin composition including (A) an alkali soluble resin including a repeating unit represented by the following Chemical Formula 1; (B) a photosensitive diazoquinone compound; and (C) a solvent, and a photosensitive resin film and a display device including the same.

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CHEIL INDUSTRIES INC	290 GONGDAN-DONG GUMI-SI KYEONGSANGBUK-DO 730-030

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Inventor Name	Address	# of filed Patents	Total Citations
CHEON, Hwan-Sung	Uiwang-si, KR	44	236
KANG, Jin-Hee	Uiwang-si, KR	34	201
KWON, Hyo-Young	Uiwang-si, KR	15	62
LEE, Bum-Jin	Uiwang-si, KR	27	110
NAMGUNG, Ran	Uiwang-si, KR	26	38

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Positive Photosensitive Resin Composition, Photosensitive Resin Film, and Display Device Using the Same

Number of patents in Portfolio can not be more than 2000

United States of America Patent

14291022

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