SCATTERING BAR OPTIMIZATION APPARATUS AND METHOD
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United States of America Patent
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Issued Date -
Jun 11, 2015
app pub date -
Dec 9, 2013
filing date -
Dec 9, 2013
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
A computer-implemented method is disclosed for optimizing one or more sub-resolution assist features for use in a photolithographic process. The method may include incorporating a sub-resolution assist feature within a virtual photomask. The virtual photomask may then be modeled to produce a virtual print. One or more intensity values corresponding to the sub-resolution assist feature may be collected from the virtual print. Based on the one or more intensity values, a probability of having been printed may by assigned to the sub-resolution assist feature. In an iterative process, the probability may be used to optimize at least one of a location and size of the sub-resolution assist feature.
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