POLISHING COMPOSITION AND SUBSTRATE FABRICATION METHOD USING SAME
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United States of America Patent
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Issued Date -
Jun 18, 2015
app pub date -
Jun 17, 2013
filing date -
Jun 19, 2012
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Abstract
A polishing composition contains abrasive grains, a surface adsorptive agent, and water, and is used for polishing an object formed of a crystalline metallic compound. The polishing composition reduces defects on a polished surface of the object compared to a composition obtained by excluding the surface adsorptive agent from the polishing composition.
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