METHOD AND SYSTEM FOR USE IN OPTICAL MEASUREMENTS IN DEEP THREE-DIMENSIONAL STRUCTURES
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United States of America Patent
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Issued Date -
Jun 18, 2015
app pub date -
Feb 12, 2013
filing date -
Feb 13, 2012
priority date (Note) -
Abandoned
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Abstract
A measurement system and method are presented for use in measuring in patterned structures having annularly-shaped vias. The system comprises illumination and detection channels, a polarization orientation system, a navigation system, and a control unit. The polarization orientation system provides at least one of a first polarization orientation condition corresponding to a first measurement mode enabling determination a depth of the via, and a second polarization orientation condition corresponding to a second measurement mode enabling determination of one or more parameters of a profile of the via, the first and second polarization orientation conditions defining first and second predetermined orientations respectively for polarization of the incident light relative a sidewall of the via.
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