WEAK POINTS AUTO-CORRECTION PROCESS FOR OPC TAPE-OUT
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United States of America Patent
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Issued Date -
Jun 18, 2015
app pub date -
Sep 30, 2014
filing date -
Dec 17, 2013
priority date (Note) -
Abandoned
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Abstract
A method of optical proximity correction includes (a) providing an initial OPC model based on a target design layout, (b) performing a nominal simulation on the initial OPC model, inspecting the simulated OPC model, performing a process window OPC simulation on the inspected OPC model and inspecting the simulated OPC model, (c) determining a presence of weak points. If no weak point is detected, the simulated OPC model is the final OPC model that is used to fabricate a mask. If weak points are detected, making an OPC on the weak points, performing a process window OPC simulation on the corrected weak points, and inspecting the simulation results, repeating the process window OPC simulation and the inspection until all weak points are eliminated, and outputting the final OPC model, and (d) fabricating the mask based on the final OPC model.
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