Copolymer, monomer composition, resin solution, and resin film

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United States of America Patent

PATENT NO 9260554
APP PUB NO 20150175729A1
SERIAL NO

14413570

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Abstract

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A copolymer of the present invention comprises a repeating unit derived from phenylphenyl (meth)acrylate; a repeating unit derived from a hydroxyphenyl group-containing unsaturated compound; and a repeating unit derived from an epoxy group-containing unsaturated compound. The copolymer of the present invention brings together excellent transparency and a high refractive index. A resin film formed from the copolymer of the present invention can be suitably utilized in the formation of a protective film or interlayer insulating film for an electronic part such as a liquid crystal display device, an integrated circuit device, or a solid-state imaging device, the formation of a microlens or a microlens array, the formation of an optical waveguide, or the like.

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Patent Owner(s)

  • SHOWA DENKO K.K.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Endo, Atsuo Gunma, JP 3 10
Ichikawa, Takao Gunma, JP 2 6
Kobayashi, Masayuki Gunma, JP 201 1490
Tsujimura, Yumi Gunma, JP 2 6

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