Additives to improve the performance of a precursor source for cobalt deposition

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United States of America Patent

PATENT NO 9090964
APP PUB NO 20150176119A1
SERIAL NO

14134087

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Abstract

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Methods of forming cobalt films utilizing a cobalt precursor comprising an additive are described. Those methods may include adding an additive to a cobalt precursor, wherein the cobalt precursor is located in an ampoule that is coupled with a deposition tool, and then forming a cobalt film using the cobalt precursor comprising the additive. Non-volatile decomposition products of the cobalt precursor are solubilized in the ampoule.

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Patent Owner(s)

  • INTEL CORPORATION

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Bergstrom, Daniel B Lake Oswego, US 20 109
Blackwell, James M Portland, US 52 543
Clendenning, Scott B Portland, US 82 816
Romero, Patricio E Portland, US 25 641

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