Substrate Processing Apparatus
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United States of America Patent
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Issued Date -
Jun 25, 2015
app pub date -
Dec 17, 2014
filing date -
Dec 20, 2013
priority date (Note) -
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Abstract
There is provided a substrate processing apparatus including: a chamber providing an internal space, in which a substrate is transferred through a passage and a process is performed on the substrate, and having a supply port supplying a gas to the substrate; and a susceptor installed in the internal space and including a heating region heating the substrate and a pre-heating region pre-heating the gas supplied from the supply port.
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