A DUAL INTERFEROMETER SYSTEM WITH A SHORT REFERENCE FLAT DISTANCE FOR WAFER SHAPE AND THICKNESS VARIATION MEASUREMENT

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United States of America Patent

APP PUB NO 20150176973A1
SERIAL NO

13316223

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Abstract

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An interferometer system is disclosed. The interferometer system includes two spaced apart reference flats having corresponding reference surfaces forming a cavity therebetween for placement of a polished opaque plate. The surfaces of the plate are approximately 2.5 millimeters or less from the corresponding reference surfaces when the plate is placed in the cavity. The interferometer system also includes two interferometer devices located on diametrically opposite sides of the cavity to map the surfaces of the plate. A light source is optically coupled to the interferometer devices. The light source includes an illuminator configured for producing light of multiple wavelengths and an optical amplitude modulator configured for stabilizing power of the light produced by the illuminator. The interferometer system further includes two interferogram detectors, and at least one computer coupled to receive the outputs of the interferogram detectors for determining thickness variations of the plate.

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Patent Owner(s)

Patent OwnerAddress
KLA-TENCOR CORPORATIONONE TECHNOLOGY DRIVE MILPITAS CA 95035

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
An, Zeng Andrew Fremont, US 3 5
Goodman, Frederick Arnold Oakland, US 3 4
Huang, Chunsheng San Jose, US 11 109
Tang, Shouhong Santa Clara, US 27 234
Tsai, Fuu-Ren Milpitas, US 1 4
Wang, Chunhai Pleasanton, US 9 35
Zhang, Yi Sunnyvale, US 881 7604

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