Limiting migration of target material
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United States of America Patent
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Feb 7, 2017
Grant Date -
Jun 25, 2015
app pub date -
Jun 14, 2012
filing date -
Jun 14, 2012
priority date (Note) -
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Abstract
In an electron irradiation system, a gas-tight housing encloses a cathode region and an irradiation region, which communicate through at least an aperture. In the cathode region, there is arranged a high-voltage cathode for emitting an electron beam. In the irradiation region, there is an irradiation site arranged to accommodate a stationary or moving object to be irradiated. The migration of cathode-degrading debris is limited by means of an electric field designed to prevent positively charged particles from entering the cathode region via the aperture. The invention can be embodied with an axial electric field, which realizes an energy threshold, or a transversal field which deflects charged particles away from trajectories leading into the cathode region.
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