DRY ETCHING DEVICE AND ELECTRODE THEREOF
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United States of America Patent
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Issued Date -
Jun 25, 2015
app pub date -
May 27, 2014
filing date -
Dec 24, 2013
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Abstract
The invention discloses a dry etching device and an electrode thereof. The electrode comprises an electrode base, an insulation layer arranged on the electrode base, and an edge stage located on a peripheral surface of the insulation layer. The edge stage comprises at least a pad each for receiving a lifter pin of the dry etching device. The edge stage comprises various embosses arranged peripherally on the edge stage, so that small gaps are present around the embosses between the substrate and the edge stage. Therefore, the adhesive force between the substrate and the edge stage can be reduced, the adsorption phenomenon can be efficiently improved, the yield of the etched substrate can be enhanced and the life of the electrode of the dry etching device can be increased.
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