GROUP III-V SEMICONDUCTOR TRANSISTOR AND METHOD OF MANUFACTURING THE SAME

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United States of America Patent

APP PUB NO 20150179787A1
SERIAL NO

14577478

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Abstract

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Provided are group III-V semiconductor transistors and methods of manufacturing the same. The method includes forming a group III-V semiconductor channel layer on a substrate, forming a gate insulating layer covering the group III-V semiconductor channel layer, and forming a protection layer including sulfur between the group III-V semiconductor channel layer and the gate insulating layer by annealing the substrate under a sulfur atmosphere.

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Patent Owner(s)

Patent OwnerAddress
SAMSUNG ELECTRONICS CO LTDGYEONGGI DO ROAD SOUTH KOREA SAMSUNG SUWON CITY LINGTONG DISTRICT NO 129 SUWON GYEONGGI-DO

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
CHO, Seong-ho Gwacheon-si, KR 102 1320
CHO, Young-jin Seoul, KR 106 1252
LEE, Dong-Soo Gunpo-si, KR 72 568
LEE, Myoung-Jae Hwaseong-si, KR 66 1488
PARK, Tae-Joo Ansan-si, KR 2 13

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