Positive resist composition and method of pattern formation with the same
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United States of America Patent
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Jan 10, 2017
Grant Date -
Jul 2, 2015
app pub date -
Mar 4, 2015
filing date -
Jul 26, 2005
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Abstract
A positive resist composition comprising: (A) a resin which comes to have an enhanced solubility in an alkaline developing solution by an action of an acid; (B) a compound which generates an acid upon irradiation with actinic rays or a radiation; (C) a fluorine-containing compound containing at least one group selected from the groups (x) to (z); and (F) a solvent, and a method of pattern formation with the composition: (x) an alkali-soluble group; (y) a group which decomposes by an action of an alkaline developing solution to enhance a solubility in an alkaline developing solution; and (z) a group which decomposes by an action of an acid.
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