Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device using the same, and electronic device

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United States of America Patent

PATENT NO 9291897
SERIAL NO

14605292

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Abstract

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There is provided a pattern forming method comprising, in order, (1) a step of forming a film by using an actinic ray-sensitive or radiation-sensitive resin composition containing (Ab) a resin having specific repeating units, (2) a step of exposing the film by using an electron beam or an extreme-ultraviolet ray, and (3) a step of developing the exposed film by using an organic solvent-containing developer to form a negative pattern.

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Patent Owner(s)

  • FUJIFILM CORPORATION

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hirano, Shuji Shizuoka, JP 69 301
Nihashi, Wataru Shizuoka, JP 33 105
Takizawa, Hiroo Shizuoka, JP 119 919
Yokokawa, Natsumi Shizuoka, JP 27 119

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