Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, manufacturing method of electronic device using the same, and electronic device

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United States of America Patent

PATENT NO 9448477
APP PUB NO 20150185612A1
SERIAL NO

14656997

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Abstract

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There is provided an actinic ray-sensitive or radiation-sensitive resin composition comprising: (A) a resin having a repeating unit represented by the specific formula and a group capable of decomposing by an action of an acid to produce a polar group; and an ionic compound represented by the specific formula, and a resist film comprising the actinic ray-sensitive or radiation-sensitive resin composition.

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Patent Owner(s)

  • FUJIFILM CORPORATION

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kawabata, Takeshi Shizuoka, JP 104 1210
Takizawa, Hiroo Shizuoka, JP 119 919
Tsubaki, Hideaki Shizuoka, JP 99 2132

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