Nanoscale patterning method and integrated device for electronic apparatus manufactured therefrom
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United States of America Patent
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Nov 7, 2017
Issued Date -
Jul 2, 2015
app pub date -
Dec 26, 2014
filing date -
Dec 26, 2013
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Abstract
Provided is a nanoscale patterning method using self-assembly, wherein nanoscale patterns having desirable shapes such as a lamella shape, a cylinder shape, and the like, may be formed by using a self-assembly property of a block copolymer, and low segment interaction caused in a structure of 10 nm or less which is a disadvantage of the block copolymer may be prevented. In addition, even though single photolithography is used, pattern density may double as that of the existing nano patterns, and pitch and cycle of the patterns may be controlled to thereby be largely utilized for electronic apparatuses requiring high integration of circuits such as a semiconductor device, and the like.
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