PHOTO-PATTERNABLE DIELECTRIC MATERIALS AND FORMULATIONS AND METHODS OF USE

United States of America Patent

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Mar 11, 2015
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Aug 31, 2009

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Abstract

Silsesquioxane polymers, silsesquioxane polymers in negative tone photo-patternable dielectric formulations, methods of forming structures using negative tone photo-patternable dielectric formulations containing silsesquioxane polymers, and structures made from silsesquioxane polymers.

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Patent Owner	Address
GLOBALFOUNDRIES INC	GRAND CAYMAN CAYMAN ISLANDS GRAND CAYMAN CAYMAN ISLANDS

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H05K:PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAIL....

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[Patents Count]

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Inventor Name	Address	# of filed Patents	Total Citations
Allen, Robert D	San Jose, US	65	948
Brock, Phillip J	San Jose, US	20	160
Davis, Blake W	San Jose, US	14	241
Lin, Qinghuang	Yortown Heights, US	150	2181
Miller, Robert D	San Jose, US	159	2225
Nelson, Alshakim	San Jose, US	55	622
Sooriyakumaran, Ratnam	San Jose, US	126	2261

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PHOTO-PATTERNABLE DIELECTRIC MATERIALS AND FORMULATIONS AND METHODS OF USE

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United States of America Patent

14644416

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14644416

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