SUBSTRATE PROCESSING DEVICE
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United States of America Patent
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Issued Date -
Jul 9, 2015
app pub date -
Aug 23, 2013
filing date -
Aug 28, 2012
priority date (Note) -
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status (Latency Note)
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Abstract
Provided is a substrate processing apparatus. The substrate processing apparatus in which a process with respect to a substrate is performed includes a chamber body having an opened upper side, the chamber body including a passage defined in a side thereof so that the substrate is loaded or unloaded through the passage, a chamber cover disposed on the chamber body to cover the opened upper side of the chamber body, the chamber cover providing a process space in which the process with respect to the substrate is performed, a susceptor disposed within the process space to heat the substrate, and a heating block disposed on an upper or lower portion of the passage to preliminarily heat the substrate loaded through the passage.
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