ROUGHENED SUBSTRATE SUPPORT
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United States of America Patent
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Issued Date -
Jul 23, 2015
app pub date -
Mar 31, 2015
filing date -
Jul 27, 2012
priority date (Note) -
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status (Latency Note)
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Abstract
The present disclosure generally relates to a substrate support for use in a substrate processing chamber. A roughened substrate support reduces arcing within the chamber and also contributes to uniform deposition on the substrate. A substrate support may have a substrate support body having a surface roughness of between about 707 micro-inches and about 834 micro-inches. The substrate support may have an anodized coating on the substrate support.
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