Imprint pattern guided self-assembly of lamellar block copolymer for BPM

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United States of America Patent

PATENT NO 9773520
APP PUB NO 20150206548A1
SERIAL NO

14158611

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Abstract

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The embodiments disclose a method of using a trimmed imprinted resist and chemical contrast pattern to guide a directed self-assembly (DSA) of a predetermined lamellar block copolymer (BCP), creating chromium (Cr) lamellar guiding lines using the BCP and DSA in a dry Cr lift-off process and etching the Cr lamellar guiding line patterns into a substrate to fabricate the imprint template.

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Patent Owner(s)

  • SEAGATE TECHNOLOGY LLC

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hsu, Yautzong Fremont, US 20 36
Lee, Kim Y Fremont, US 71 428
Wang, HongYing Fremont, US 28 78
Xiao, Shuaigang Fremont, US 50 300
Yang, XiaoMin Livermore, US 69 872

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