Photosensitive transfer material, pattern formation method, and etching method

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United States of America Patent

PATENT NO 9810984
SERIAL NO

14687491

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Abstract

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A photosensitive transfer material including a support, a thermoplastic resin layer, and a photosensitive resin composition layer in this order, in which the photosensitive resin composition layer includes a polymer component (A) including a polymer having a constituent unit (a1) that includes a group in which an acid group is protected by an acid-decomposable group and a photoacid generator (B).

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Patent Owner(s)

  • FUJIFILM CORPORATION

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Fujimoto, Shinji Fujinomiya, JP 96 725
Ito, Hideaki Fujinomiya, JP 124 990
Kawabe, Yasumasa Fujinomiya, JP 48 462

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