SUBSTRATE TREATMENT DEVICE AND METHOD AND ENCODER SCALE TREATED BY THIS METHOD
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United States of America Patent
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Apr 27, 2015
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Nov 15, 2001
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Abstract
A method of forming an encoder scale for a measurement device is disclosed. The method comprises taking a laser and a substrate carrying an etch-resistant film. Parts of the etch-resistant film are removed by use of the laser, thereby forming a pattern on the substrate that defines an encoder scale, and the substrate is etched through the parts of the etch-resistant film that have been removed by the laser.
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