APPARATUS AND METHOD FOR ATOMIC FORCE MICROSCOPY
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United States of America Patent
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Aug 13, 2015
app pub date -
Jul 5, 2013
filing date -
Jul 5, 2012
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Abstract
An apparatus (100) for performing atomic force microscopy is disclosed. The apparatus comprises an AFM measurement unit (102) configured to operate in a first controlled atmosphere (300) and a pretreatment unit (101) configured to operate in a second controlled atmosphere (400), the second controlled atmosphere being different from the first controlled atmosphere. The pretreatment unit is connected to the AFM measurement unit. In one embodiment, the second controlled atmosphere is a vacuum atmosphere, whereas the first controlled atmosphere includes at least an inert gas.
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