METHOD AND APPARATUS FOR THREE DIMENSIONAL ION IMPLANTATION
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United States of America Patent
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Aug 13, 2015
app pub date -
Feb 13, 2014
filing date -
Feb 13, 2014
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Abstract
A scan system for processing a substrate with an ion beam may include a scanner to receive the ion beam having a shape of a ribbon beam, the ribbon beam having a beam width along a first axis and beam height along a second axis that is perpendicular to the first axis, the beam width being at least three times greater than the beam height; and a scan power supply to send signals to the scanner to generate a deflecting field that deflects the ribbon beam along the second axis.
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