Importance

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Abstract

Provided is a substrate processing apparatus. The substrate processing apparatus includes a process unit in which a process for processing substrates is performed, a loadport on which an accommodation container accommodating the substrates is disposed, a frame disposed between the process unit and the loadport to define an inner space, an internal container having an accommodation space communicating with the internal space and an inlet through which the substrates are loaded into or unloaded from the accommodation space, the internal container having a plurality of discharge holes in a rear surface facing the inlet, an external container disposed outside the internal container to define a discharge space communicating with the accommodation space through the discharge holes, an exhaust hole defined in the external container to communicate with the discharge space, and an exhaust line in which an exhaust pump forcibly exhausting the inside of the accommodation space is disposed, the exhaust line being connected to the exhaust hole.

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First Claim