MASK PATTERN CORRECTION METHOD AND NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM CONTAINING A MASK PATTERN CORRECTION PROGRAM
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United States of America Patent
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Issued Date -
Aug 20, 2015
app pub date -
Jul 3, 2014
filing date -
Feb 18, 2014
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
According to one embodiment, a first auxiliary pattern is arranged at a corner of a mask pattern, an arrangement position of a second auxiliary pattern is calculated based on an opening angle of a resist pattern to which the mask pattern is transferred, and the second auxiliary pattern is arranged at the arrangement position.
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