METHOD OF FORMING AN INSULATOR LAYER IN A SEMICONDUCTOR STRUCTURE AND STRUCTURES RESULTING THEREFROM
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United States of America Patent
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Issued Date -
Aug 20, 2015
app pub date -
May 5, 2015
filing date -
May 7, 2010
priority date (Note) -
Abandoned
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Abstract
An electronic system, method of manufacture of a semiconductor structure, and one or more semiconductor structures are disclosed. For example, a method of manufacture of a semiconductor structure is disclosed, which includes forming a first semiconductor substructure over a semiconductor substrate, forming a first spacer layer over the first semiconductor substructure and the semiconductor substrate, and forming a second semiconductor substructure over at least a portion of the first spacer layer.
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