Reticle Cleaning by Means of Sticky Surface
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United States of America Patent
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N/A
Issued Date -
Aug 27, 2015
app pub date -
Jul 30, 2013
filing date -
Aug 31, 2012
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
Methods and systems are described for cleaning contamination from the surface of an object within a lithographic apparatus. A lithographic apparatus is provided that includes an illumination system configured to condition a radiation beam, a support constructed to hold a patterning device (302), the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, and a projection system configured to project the patterned radiation beam onto a target portion of the substrate. The lithographic apparatus further includes a cleaning system (500) for cleaning particles off of a surface of either the support or the patterning device. The cleaning system includes a cleaning surface (502) designed to contact the surface of either the support or the patterning device.
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