METHOD AND APPARATUS FOR TEMPORARY BONDING OF ULTRA THIN WAFERS

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United States of America Patent

SERIAL NO

14714587

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Abstract

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An apparatus for temporary bonding first and second wafers includes, a first coating chamber configured to apply a first adhesive layer upon a first surface of a first wafer; a second coating chamber configured to apply a second adhesive layer upon a first surface of a second wafer; a curing chamber configured to cure the first adhesive layer of the first wafer; a bonder module comprising an upper chuck assembly and a lower chuck assembly arranged below and opposite the upper chuck assembly. The upper chuck assembly is configured to hold the first wafer so that its first surface with the cured first adhesive layer faces down. The lower chuck assembly is configured to hold the second wafer so that the second adhesive layer faces up and is opposite to the cured first adhesive layer. The lower chuck assembly is configured to move upwards and thereby to bring the second adhesive layer in contact with the cured first adhesive layer. The curing chamber is further configured to cure the second adhesive layer after it is brought in contact with the cured first adhesive layer, thereby forming a temporary bond between the first and second wafers.

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Patent Owner(s)

Patent OwnerAddress
SUSS MICROTEC LITHOGRAPHY GMBHSCHLEISSHEIMER STRASSE 90 GARCHING 85748

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
GEORGE, GREGORY COLCHESTER, US 42 589
Lutter, Stefan Eisingen, DE 9 34

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