SUBSTRATE PROCESSING APPARATUS
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United States of America Patent
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Issued Date -
Sep 10, 2015
app pub date -
Sep 17, 2013
filing date -
Sep 17, 2012
priority date (Note) -
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Abstract
Provided is a substrate processing apparatus. The substrate processing apparatus in which a process with respect to a substrate is performed includes a main chamber having an opened upper portion, the main chamber having a passage that is defined in a sidewall thereof so that a substrate is accessible, a chamber cover disposed on the opened upper portion of the main chamber to provide a process space, which is sealed from the outside, in which the process is performed, a susceptor plate on which the substrate is placed, the susceptor plate having an inner space with an opened lower portion, and a main heater rotatably disposed in the inner space, the main heater being spaced apart from the susceptor plate to heat the susceptor plate.
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