MASK AND PATTERN FORMING METHOD
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United States of America Patent
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app pub date -
Aug 20, 2014
filing date -
Mar 7, 2014
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
According to one embodiment, a mask includes a first pattern portion and an intermediate member. The first pattern portion includes a plurality of first light transmission parts disposed periodically and having transmittivity with respect to light, and first shielding parts provided between each of the plurality of first light transmission parts and having a transmittance with respect to the light lower than a transmittance of the plurality of first light transmission parts. The intermediate member is provided on the first pattern portion. The intermediate member has a thickness in accordance with the wavelength of the light and a first period of the first light transmission parts.
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