POLYUREA-BASED MATERIAL, POLISHING AND GRINDING MEDIA INCLUDING THE POLYUREA-BASED MATERIAL, AND METHODS OF FORMING AND USING SAME
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United States of America Patent
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Issued Date -
Sep 17, 2015
app pub date -
Mar 11, 2015
filing date -
Mar 14, 2014
priority date (Note) -
Abandoned
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Abstract
Polyurea-based materials suitable for grinding media and polishing media, media including the polyurea-based material, and methods of forming and using the polyurea-based material and media are disclosed. The polyurea-based material is formed using one or more secondary polyamines, which allows for slower reaction rates and produces material having desired properties.
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