LITHOGRAPHY APPARATUS, AND METHOD OF MANUFACTURING ARTICLE
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United States of America Patent
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Issued Date -
Sep 17, 2015
app pub date -
Mar 4, 2015
filing date -
Mar 14, 2014
priority date (Note) -
Abandoned
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Abstract
A lithography apparatus advantageous in increasing both a throughput and overlay accuracy is provided. The apparatus includes a plurality of charged particle optical systems each irradiating a substrate with a charged particle beam, and a plurality of alignment sensors including an alignment sensor located among the plurality of charged particle optical systems. A processor generates, in parallel with a patterning, information on at least one of a position and a shape of a region on the substrate based on outputs from the plurality of alignment sensors.
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