SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME

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United States of America Patent

APP PUB NO 20150262819A1
SERIAL NO

14476454

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Abstract

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According to one embodiment, a semiconductor device includes a first semiconductor layer, a first electrode provided on the first semiconductor layer, and a second electrode provided on the first semiconductor layer. The second electrode is apart from the first electrode in a second direction crossing a first direction from the first semiconductor layer toward the first electrode. The first electrode includes a first electrode layer and a second electrode layer. The first electrode layer includes a first metal. The second electrode layer is provided between the first electrode layer and the first semiconductor layer, and includes a second metal. The second metal has a melting point lower than a melting point of the first metal. A distance along the second direction between the first electrode layer and the second electrode is shorter than a distance along the second direction between the second electrode layer and the second electrode.

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Patent Owner(s)

Patent OwnerAddress
KABUSHIKI KAISHA TOSHIBA1-1 SHIBAURA 1-CHOME MINATO-KU TOKYO 105-0023

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Motai, Takako Yokohama Kanagawa, JP 26 210

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